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The Beneq nFog aerosol deposition system allows for the deposition of thin films using a variety of solution precursors. Presently, the system has been used to deposit metal oxide thin films on wafers as large as 150 mm.
The Hiden temperature-programmed desorption (TPD) workstation introduces powerful new thin-film characterization capabilities to MaSC. Through the attached mass spectrometer, we are able to identify chemical species as they leave the thin-film materials under study during thermal ramp up.
The J.A. Woollam epectroscopic ellipsometer allows for the study of the optical and dielectric properties of thin films. We commonly use this instrument as a non-destructive way to determine the film thickness and refractive index of our samples. The instrument can be programmed with multi-point recipes which enable contour-like mapping of film characteristics.
The Digital Instruments NanoScope IIIa SPM atomic force microscope (AFM) allows us to determine the surface roughness of our materials with sub-nanometer resolution. Many of the thin films developed by the CSMC have atomically-smooth surfaces, which approach the noise floor of this instrument. The allowable sample sizes are approximately 1 cm x 1 cm.