MaSC : Materials Synthesis and Characterization Facility

The Materials Synthesis and Characterization Facility (MaSC) is a comprehensive resource that serves as both an open user facility and an innovation center.  MaSC faculty and staff provide deep experience in thin-film deposition, device fabrication, and materials analysis, serving as a hub for materials and device development on the Oregon State University campus.

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The Beneq nFog aerosol deposition system allows for the deposition of thin films using a variety of solution precursors. Presently, the system has been used to deposit metal oxide thin films on wafers as large as 150 mm.

The Hiden temperature-programmed desorption (TPD) workstation introduces powerful new thin-film characterization capabilities to MaSC. Through the attached mass spectrometer, we are able to identify chemical species as they leave the thin-film materials under study during thermal ramp up.

The J.A. Woollam epectroscopic ellipsometer allows for the study of the optical and dielectric properties of thin films. We commonly use this instrument as a non-destructive way to determine the film thickness and refractive index of our samples. The instrument can be programmed with multi-point recipes which enable contour-like mapping of film characteristics.

The Digital Instruments NanoScope IIIa SPM atomic force microscope (AFM) allows us to determine the surface roughness of our materials with sub-nanometer resolution. Many of the thin films developed by the CSMC have atomically-smooth surfaces, which approach the noise floor of this instrument. The allowable sample sizes are approximately 1 cm x 1 cm.

Panorama of the MaSC lab space located in Gilbert Hall 110/114 on the Oregon State University campus. Additional MaSC facilities include cleanroom bays in Owen Hall (virtual tours coming soon).

View more on the MaSC homepage.