The research team at Rutgers University is lead by Dr. Eric Garfunkel.
“One project we work on within the Center is to produce high sensitivity inorganic resists for lithography, starting from solution phase clusters. HafSOx [=HfO2–x(SO4)x] is one promising inorganic resist candidate for extreme UV photolithography. Both surface and thin film characterization has been performed to help better understand the growth, patterning and processing mechanisms. We employ a powerful range of tools for characterization.” [x]
You can learn more about those tools below.
Note: Safari users must have WebGL enabled to view the virtual tours.
Medium-energy ion scattering (MEIS)
"Medium-energy ion scattering (MEIS) is a powerful technique in surface science for the determination of structural and compositional properties of surfaces and thin films. Basically, light ions (usually p+ or He+) with an energy of 40-400 keV are incident along a major crystallographic direction in the solid (channeling). Energy and angle resolved detection of backscattered ions provides surface structural and compositional information. The ions are created and accelerated in a 400 keV ion implanter produced by High Voltage Engineering (Amersfoort, The Netherlands). The layout of the accelerator, beam line, and ultra-high vacuum equipment is shown below. Ions of virtually any type are created at a source and initially accelerated to 10, 20, or 30 keV. After passing a mass selecting magnet, the ions are accelerated to their final energy in the acceleration tube. Another selecting magnet steers the ion beam into the beam line. Several focussing elements lie along the path of the beam, including two quadrupole lenses. Electrostatic steering elements align the beam along the axis of two beam collimating slits. These slits determine the angular divergence and spot size of the beam on the sample. The beam spot size is 1 mm wide and 0.1 mm high."
Nion UltraSTEM™ 100
“The UltraSTEM™ 100 is a high-performance dedicated scanning-transmission electron microscope (STEM) with many unique features. Its flexible column provides < 1 Å resolution imaging as well as rapid nanoanalysis with an atom-sized electron probe containing >0.5 nA of current, and efficient coupling into a variety of detectors. It can also produce high-quality diffraction patterns and even CTEM images.” [x]
Zeiss Orion helium ion microscope
"This uses a beam of helium ions, rather than electrons, that can be focused into a smaller probe size and reveal a much stronger sample interaction compared to electrons, generating higher resolution images with striking material contrast." [x]