"The electronic materials start-up Inpria plans to build a facility in Corvallis, Ore., to manufacture its metal oxide-based photoresists. Developed in Oregon State University’s chemistry department, the resists are intended to be used with extreme UV lithography to create computer chip circuit lines less than 7 nm wide. The company says it will pay for the plant by tapping into $10 million it raised from investors earlier this year." From C&EN
You can read the full Inpria press release here.