Selective dissolution of hafnium-peroxo-sulfate films in aqueous tetramethylammonium hydroxide enables extreme UV lithographic patterning of sub-10 nm HfO2

The reaction path from aqueous oxohydroxometalate [(CH3)4N]6[H2Ta6O19]·xH2O to Ta
Inpria announces a new round of funding and continues research to improve chip technology